- **General**: Factory-built hot-water boiler plant installed inside insulated, walk-in outdoor enclosure with lighting, receptacles, and ½-ton hoist. - **Boilers**: Four AERCO Benchmark 5000 condensing, low-NOx, natural gas boilers with stainless steel heat exchangers, sequenced via AERCO master/PLC, total input 20,000 MBH (20.0 MMBtu/h). - **Hydronic System**: Primary/secondary design with VFD-driven pumps: - Primary Hot Water Pumps (PHWP-01 to PHWP-04) sized for ~750 GPM total at ΔT 40°F. - Secondary Hot Water Pumps (SHWP-01 and SHWP-02), VFD-driven and differentially pressure-controlled for ~720 GPM total. - **Control System**: Allen-Bradley ControlLogix redundant PLC with 10" HMI, cULus certified, integrated UPS for orderly shutdown. - **Building Automation Integration**: Native BACnet/IP for plant-to-BAS communications; boilers connected via Modbus RTU gateway. - **Instrumentation**: - ONICON 6" flow meter on secondary header. - Rosemount differential pressure transmitter for zone DP. - Factory-installed RTDs and PTs at headers for temperature and pressure monitoring. - **Hydronic Accessories**: Hydraulic separator, neutralization tank, backflow preventer, and corrosion coupon rack included. - **Interfaces & Utilities**: - HW supply/return: 6" 150# ANSI flanged connections. - Fuel gas: 4" 150# ANSI flange. - Make-up water: 1-1/4" FNPT. - Base drain: 3" FNPT. - Power: Single feed 460V, 3-phase, 60Hz main distribution. - **Enclosure**: - Walk-in insulated enclosure (Metl-Span panels approx. 2.5" thick) with TPO roofing, two double doors. - Approximate footprint 40' L × 15'10" W × 11'1" H on structural steel skid. - **Documentation & Testing**: - Complete drawing set (P&IDs, one-lines, panel and I/O drawings, network/BAS details). - Factory Acceptance Test (FAT) performed in 2022 including performance and QA records. - **Condition & Services**: Modern build with FAT verification, available for redeployment. Optional de-installation, rigging, transport, setup, commissioning, BAS integration, startup, validation, and O&M handover support.

- **Manufacturer**: Wilco (Switzerland) - **Leak Testing Machine R DPV 400-36**: - 36 test stations - Throughput: up to 400 vials per minute - Test methods: Vacuum decay and pressure decay - Leak detection sensitivity: ≥ 10 µm diameter - Suitable for lyophilized and liquid pharmaceutical products - Vial format range: 2R to 50 ml - Machine dimensions: 600 cm (L) x 250 cm (W) x 105 cm (H) - Weight: 6,804.09 kg (metric), 18,000 lbs (imperial) - **Gas Analyzer SPECTRA HSX 500**: - 10 oxygen (O2) laser heads - 1 water vapor (H2O) laser head - Non-destructive optical measurements for oxygen, water vapor, and carbon dioxide partial pressures - Measures vial pressure efficiently with 98% machine efficiency - Supports fixed gas and air ingress detection methods - **Additional details**: - Harmonized Code: 903180 (precision laboratory instruments) - Shipping dimensions: 1828.8 cm x 762.0 cm x 320.04 cm (metric); 720 lb x 300 lb x 126 lb (imperial) - **Applications**: Industrial leak testing and headspace gas analysis, primarily for pharmaceutical packaging quality control.

The **Obducat Sindre Platform** is a **fully automated nanoimprint lithography system** engineered for **high-volume nanofabrication** and **precision wafer processing** at sub-50nm resolution. It supports **2–8 inch diameter flexible and rigid substrates**, making it suitable for advanced applications in **optics, photonics, biomedical devices, LEDs, MEMS, and sensor production**. Key technical features include: - **IPS technology** ensuring superior contamination control critical for cleanroom environments (Class 100 compatibility) - **SoftPress technology** for uniform imprint pressure across substrates, enabling reproducible and consistent nanoimprint patterns - Imprint pressure adjustable between **5 and 50 bar** and maximum imprint temperature of **200°C**, facilitating diverse polymer and UV-curable resist processes - UV exposure at **365 nm wavelength** optimized for photopolymerization in nanoimprint lithography - High throughput with processing speeds of up to **70 wafers per hour**, supporting large-scale biomanufacturing and semiconductor research workflows - Integrated computer and software for precise process control and automation, essential for molecular diagnostics device fabrication and synthetic biology tools manufacturing - Designed for installation in facilities with dedicated power (400 VAC, 3-phase), compressed air (6–8 bar), and suitable exhaust management This system is **widely used in biotechnology-driven nanofabrication applications** such as **biomedical engineering, molecular diagnostics device prototyping, and bioprocessing instrumentation manufacturing**. Its precision and repeatability make it valuable in **biopharmaceutical production pipelines** and **advanced research labs focusing on nanoscale device engineering**. The pre-owned system requires installation in appropriate facilities with operational verification by qualified personnel to ensure compliance with environmental and technical specifications. This nanoimprint lithography system offers a critical platform for researchers and industrial users engaged in **high-resolution nanofabrication, nano-patterning for biosensor development, and integration of nanoscale features in biotechnological applications**.